Advanced system check
From BioDIP
(Difference between revisions)
Line 9: | Line 9: | ||
**requirements: Zeiss/Leica Convallaria demo sample | **requirements: Zeiss/Leica Convallaria demo sample | ||
**work flow: acquire two images in basic resolution (512x512), blue ex / green em plus transmitted light image, using 10x objective | **work flow: acquire two images in basic resolution (512x512), blue ex / green em plus transmitted light image, using 10x objective | ||
− | + | * field of illumination | |
+ | ** purpose: check for even illumination | ||
+ | ** requirements: mirror | ||
+ | ** work flow: 80/20 mirror, 488 nm laser, pinhole 1 AU. focus on reflective side of mirror. try to obtain "japanese flag". | ||
*psf | *psf | ||
**purpose: | **purpose: |
Revision as of 14:24, 21 September 2009
MPI-CBG LMF
Advanced System Check
Protocol (draft)
- fluorescence and bright field imaging (all systems)
- purpose: test general performance of the system - basic functions work fine? + Koehler illumination, light paths ok?
- requirements: Zeiss/Leica Convallaria demo sample
- work flow: acquire two images in basic resolution (512x512), blue ex / green em plus transmitted light image, using 10x objective
- field of illumination
- purpose: check for even illumination
- requirements: mirror
- work flow: 80/20 mirror, 488 nm laser, pinhole 1 AU. focus on reflective side of mirror. try to obtain "japanese flag".
- psf
- purpose:
- requirements:
- work flow:
- overlay UV/V and VIS (confocal systems with separate UV/V laser coupling)
- purpose: check the coupling precision of the UV/V laser
- requirements: 0.2/0.5µm fluorescent beads sample
- work flow: open pinhole(s), use high resolution apochromatic lens (NA 1.2 or above), acquire two images (UV/V plus VIS channel) with good sampling (pixel size ~100nm)