Advanced system check

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**requirements: Zeiss/Leica Convallaria demo sample
 
**requirements: Zeiss/Leica Convallaria demo sample
 
**work flow: acquire two images in basic resolution (512x512), blue ex / green em plus transmitted light image, using 10x objective
 
**work flow: acquire two images in basic resolution (512x512), blue ex / green em plus transmitted light image, using 10x objective
 
+
* field of illumination
 +
** purpose: check for even illumination
 +
** requirements: mirror
 +
** work flow: 80/20 mirror, 488 nm laser, pinhole 1 AU. focus on reflective side of mirror. try to obtain "japanese flag".
 
*psf
 
*psf
 
**purpose:  
 
**purpose:  

Revision as of 14:24, 21 September 2009

MPI-CBG LMF

Advanced System Check

Protocol (draft)

  • fluorescence and bright field imaging (all systems)
    • purpose: test general performance of the system - basic functions work fine? + Koehler illumination, light paths ok?
    • requirements: Zeiss/Leica Convallaria demo sample
    • work flow: acquire two images in basic resolution (512x512), blue ex / green em plus transmitted light image, using 10x objective
  • field of illumination
    • purpose: check for even illumination
    • requirements: mirror
    • work flow: 80/20 mirror, 488 nm laser, pinhole 1 AU. focus on reflective side of mirror. try to obtain "japanese flag".
  • psf
    • purpose:
    • requirements:
    • work flow:
  • overlay UV/V and VIS (confocal systems with separate UV/V laser coupling)
    • purpose: check the coupling precision of the UV/V laser
    • requirements: 0.2/0.5µm fluorescent beads sample
    • work flow: open pinhole(s), use high resolution apochromatic lens (NA 1.2 or above), acquire two images (UV/V plus VIS channel) with good sampling (pixel size ~100nm)
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